化學(xué)機(jī)械拋光保持環(huán)工藝參數(shù)及磨損模型的研究.pdf

1、國內(nèi)圖書分類號：THl621國際圖書分類號：工學(xué)碩士學(xué)位論文化學(xué)機(jī)械拋光保持環(huán)工藝參數(shù)及磨損模型的研究碩士研究生；導(dǎo)師：申請學(xué)位級別：學(xué)科、專業(yè)：所在單位：答辯日期：授予學(xué)位單位：黃杏利傅增祥教授工學(xué)碩士材料加工工程材料學(xué)院9007年3月西北工業(yè)大學(xué)塑j!三些盔蘭三蘭堡主蘭垡堡苧Abs仃actDuringCMPprocesses，overgrindingappearsintheedgeofwaferwhichresultsinthede

2、creaseofplanarizationqualityandtheutilizationofwaferWiththeincreaseofthediameterofthewaferovergrindingbecomesmoreseverity乃eapplicationofretainingringcallalleviatetheovergrindingInadditionthewearpropertyofretainingringhas

3、greatinfluenceonitsnaturallifeAtpresent，thetechnicalparametersandtheweal“rateoftheretainingringaleconfirmedthroughtrialorexperience，whichusuallyhaslongerperiods、highercostandlargerwasteThepapermainlystudiesthetechnicalpa

4、rametersandtheWeal“rateofretainingringThemainworkandthenewoutlooksageasfollows：Two—dimensionalaxisymmetricstaticmodelforCMPsystemiSestablishedusingFiniteElementMethodsoftwareANSYSl00TheVonMisesstressonthewafercanpresentt

5、hepolishingqualitybecausetheyareofdirectproportionTheinfluencingdisciplinariansofthetechnicalparametersofretainingringonthepolishingqllalityareanalysedTheP2(pressureOHtheretainingring)|PI(thepressureonthewafer)andW(thega

6、pbetweenthewaferandretainingring)haveeffectivelyinfluenceTheinfluenceofA(thewidthofretainingrin曲CanbeignoredInpractice，afterWisdeterminedP分PlexistalloptimumvalueFEMisveryusefulforthedesignandtechniquedeterminationofretai

7、ningring，whichCanovercomethewasteresultingfromthepresenttrialmethod11璩optimumvalueofPOPIisabout2ThenPoPlandWCanbeoptimizedtogetherwiththejudgeofthemosthomogeneouspressureonthewafer11lcpadasperitiesareassumedtofollowthepe